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Derniers dépôts
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
77
Nombre de notices
276
Mots-clés
Chemical detection
A Thin films
TEM
B2 Quaternary
Plasmas froids
BOMBARDMENT
Magnetron sputtering
AuCu alloy
SF 6
A-CNx
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Copper
Nanocomposite
Bixbyite
Aluminium nitride
Plasma etching
V2O3
PECVD
Atomic layer etching
Kirkendall effect
Amyloid precursor
Non-volatile memory
Avalanche breakdown
Structure
Chalcogenide
Band alignment
Calcined clay
Low-pressure plasma processing
Optical properties
Physical vapor deposition
Nanotubes
Anatase
B3 Solar cells
Alloying
Transmission electron microscopy
XPS
Ambipolar material
Mott insulators
Chalcogenides
TiO2
Semiconductors
Titanium dioxide
Oxides
B2 Semiconducting alloys
Aryl-diazonium salts
Biofilms microbiens
Chemical and biological sensors
Cathepsin
Sol-gel
Transfert d'énergie
Vanadium Sesquioxide
Thin film
Films
Capacitance
Functionalization
CNTs’ collapse
3 nm in size
Carbon Nanotube
CIGSe
Thin films
B Chemical synthesis
Residual stress
Sputtering
A Multilayers
AlN
B1 Inorganic compounds
Bipolar resistive switching BRS
X-ray photoelectron spectroscopy
Alzheimer's disease
A3 Physical vapor deposition processes
Selenization
Mott insulator
NEXAFS
Amorphous
C Photoelectron spectroscopy
Atomic force microscopy
Buffer Couple
Applications industrielles
CaTiO3Pr^3^+
Spectroscopic ellipsometry
Biocapteurs
Biomasse
A Chalcogenides
B2 Semiconducting indium compounds
Chalcogenide glass
CHLORINE PLASMAS
AZO thin films
Scanning electron microscopy
X-ray diffraction
Adsorption
Band gap
Etching
A1 Characterization
Carbon nitride
Carbon nanotubes
Ablation laser
Resistive switching
CH4
Colloidal solution
Carbon