Structural and electrical properties of K3Li2Nb5O15 thin film grown by pulsed laser deposition

B. Allouche (1) , Y. Gagou (2) , A. Belboukhari , F. Le Marrec (2) , M. El Marssi (2)

1 CEA-LETI - Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information
2 LPMC - Laboratoire de Physique de la Matière Condensée - UR UPJV 2081

Potassium lithium niobate K3Li2Nb5O15 (KLN) with tetragonal tungsten bronze-type structure (TIT) thin film was successfully deposited on MgO substrate by pulsed laser ablation method. The substrate was coated by a perovskite conductive layer of La0.5Sr0.5CoO3. X-ray diffraction revealed (001) orientation with low mosaicity. The oriented film had smooth and droplets-free surface as evidenced by reflection high electron energy diffraction and atomic force microscopy. Using Pt top electrode, dielectric measurements indicated stable dielectric permittivity of about 400 up to 10(5) Hz. A dielectric relaxation was also observed. Moreover, the capacitance voltage measurements of the obtained (001)KLN film show ferroelectric behavior. Our results provide useful insights into the growth of tetragonal tungsten and other complex materials. These results will be useful for the growth and integration of epitaxial TTB thin films on perovskite and Si substrates. (C) 2017 Elsevier Ltd. All rights reserved.

Domaines: Matière Condensée [cond-mat]

B. Allouche, Y. Gagou, A. Belboukhari, F. Le Marrec, M. El Marssi. Structural and electrical properties of K3Li2Nb5O15 thin film grown by pulsed laser deposition. Materials Research Bulletin, 2017, 94, pp.287-290. ⟨10.1016/j.materresbull.2017.06.018⟩. ⟨hal-03627576⟩